FEI Co. unveiled today what it is calling the industry’s first DualBeam mask repair system for repairing 65nm photolithography mask defects, which combines a focused ion beam (FIB) column and an ...
SEOUL, South Korea, Oct. 31, 2022 /PRNewswire/ -- Park Systems, a world-leading manufacturer of Atomic Force Microscopes announced Park NX-Mask, the most effective, safe, and efficient new generation ...
“Mask repair is an essential step in the manufacturing process of extreme ultraviolet (EUV) masks. Its key challenge is to continuously improve resolution and control to enable the repair of the ...
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